Journal of the Japanese Association of Crystal Growth = 日本結晶成長学会誌
巻
30
号
3
ページ
119
発行年
2003-07-05
ISSN
0385-6275
NCID
AN00188386
出版者
The Japanese Association for Crystal Growth (JACG) = 日本結晶成長学会
抄録
With a Si(001) vicinal face in mind, we study step bunching induced by drift of adatoms taking account of the alternation of anisotropic diffusion coefficient. The step bunching occurs irrespective of the drift direction. We perform simulation of a one-dimensional step flow model and analyze growth law of the bunch size and size dependence of the step distance in a bunch.