Journal of the Ceramic Society of Japan = 日本セラミックス協会学術論文誌
巻
100
号
1159
ページ
266 - 271
発行年
1992-03-01
ISSN
0914-5400
NCID
AA12312210
出版者
The Ceramic Society of Japan = 日本セラミックス協会
抄録
Zirconia films were prepared by the CVD method using thermal decomposition of zirconium-tetra-i-propoxide with He gas under 20 kPa. The films on the substrate consisted of fine particles less than 1μm and were metastable tetragonal-zirconia. The maximum deposition rate was 6 nm/s at 673 K and a reactant gas concentration of 0.05 mol%. The profile of deposition rate was calculated using a simplified reaction and coagulation model. The calculated results showed a good agreement with the experimental data under the operating conditions of 673 K and 0.07 mol%. Deposition rates for the system used are estimated with this model.
熱CVD法によるジルコニア膜合成時の堆積速度の推定
TE-PR-KAWANISHI-T-266.pdf
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