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非晶質基板への高エネルギー入射イオンに対する電子阻止能
https://doi.org/10.24517/00011784
https://doi.org/10.24517/00011784af568344-7d82-48a0-b90a-eebb202419dd
名前 / ファイル | ライセンス | アクション |
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AN00044309-7-2-177.pdf (146.8 kB)
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2017-10-03 | |||||
タイトル | ||||||
タイトル | 非晶質基板への高エネルギー入射イオンに対する電子阻止能 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Electronic Stopping Power for Energetic Implanted Ions in Amorphous Substrates | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
ID登録 | ||||||
ID登録 | 10.24517/00011784 | |||||
ID登録タイプ | JaLC | |||||
著者 |
長谷川, 誠一
× 長谷川, 誠一 |
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著者別表示 |
Hasegawa, Seiichi
× Hasegawa, Seiichi |
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書誌情報 |
金沢大学工学部紀要 = Memoirs of the Faculty of Technology Kanazawa University 巻 7, 号 2, p. 177-184, 発行日 1973-09-25 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0022-832X | |||||
NCID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AN00044309 | |||||
出版者 | ||||||
出版者 | 金沢大学工学部 = Faculty of Technology Kanazawa University | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Results of measurement so far published on the electronic stopping power in various amorphous and crystalline substrates show periodic dependence of the stopping power on the atomic number of the incident ions. On the contrary, the theoretical values for the electronic stopping power in amorphous substrates made public up to now increase monotonously with the atomic number. In the present paper, the author proposes to apply the atomic wave function instead of commonly used Thomas-Fermi treatment for determining theoretically the electronic stopping power in amorphous substrate, especially with respect to the origin of its periodicity with atomic numbers. Results of calculations confirming the validity of the proposal are added. | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 |