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化学気相成長法による薄膜製造の高効率化
https://doi.org/10.24517/00049259
https://doi.org/10.24517/00049259235c3282-4a55-41f3-b66a-b4730538f1aa
名前 / ファイル | ライセンス | アクション |
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TE-PR-TAKIMOTO-A-kanen 1993-41p.pdf (1.2 MB)
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Item type | 報告書 / Research Paper(1) | |||||
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公開日 | 2017-12-08 | |||||
タイトル | ||||||
タイトル | 化学気相成長法による薄膜製造の高効率化 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Thin Film Formation by Particle Precipitation aided Chemical Vapor Deposition | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_18ws | |||||
資源タイプ | research report | |||||
ID登録 | ||||||
ID登録 | 10.24517/00049259 | |||||
ID登録タイプ | JaLC | |||||
著者 |
滝本, 昭
× 滝本, 昭 |
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著者別表示 |
Takimoto, Akira
× Takimoto, Akira |
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書誌情報 |
平成4(1992)年度 科学研究費補助金 一般研究(C) 研究成果報告書 en : 1992 Fiscal Year Final Research Report 巻 1991-1992, p. 41p., 発行日 1993-03 |
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出版者 | ||||||
出版者 | 金沢大学機械工学系 | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | 化学気相成長(CVD)法による薄膜は,母材と異なる耐摩耗,耐酸化,低光損失,高強度および超伝導性などの優れた特性を示し,半導体分野のみならず材料分野においてもその広範囲な用途から将来性が注目されている。しかし,材料としてこれらの特性を十分に活用するためには,膜厚と組織の均一性及び高い定着性が必須であり,従って,薄膜製造においてはこれらの条件を含めた生産性の高さが要求されることになる。 本研究は,CVD薄膜が工業材料として先導的な役割をもつ上でも不可欠である膜厚・組織の均一化の制御を含めた生産性の高い製造技術を確立することを目的に,気相で生成した微粒子を基板に堆積させ薄膜化するPPCVD(Particle Precipitation aided CVD)法を対象に基礎的プロセスについて追究したものであり,in-situな実験とCSM(Critical Supersaturation Model)に基づく理論的解析を行い,以下の成果が得られた。 (1)化学気相成長(CVD)法による薄膜製造法の現状,および工業材への応用技術ついて物理的方法を含めて調査され,各種データが収集された。 (2)原料ガス流中の核生成-拡散・輸送と基板上での凝集・成長の過程に対して,温度・濃度共存場における速度論を展開し,その過程を明らかにした。 (3)微粒子生成と基板上での衝突捕集による膜厚さ・表面構造に対する操作因子の影響をin situな実験により明らかにし,理論との対比のもとで薄膜の成長機構を明らかにした。 (4)高効率な装置の最適化の基礎を確立した。 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The very thin film made by Chemical Vapor Deposition have so superior characteristics in electric and the other properties, that they can become the center of the attention to open up in semiconductor and material fields. To make the best use of this characteristics as an element of material, the high efficiency manufacturing technology of CVD should be developed in conjunction with the operating condition of control the film at uniform thickness and density. From the standpoint, this study has been conducted to pursue the basic mechanism of thin film production in the particle precipitation aided CVD techniques including the process of self- nucleation, particle growth, and particle collection on the base. The following are the summery deduced from the investigation. 1. As the results of thin film manufacturing experiments by depositing particles on the base plate, the characteristics of the particle production in gas-flow and the film formation on the base were experimentally made clear in connection with the operating parameter such as the gas pressure, the material and gas temperature, and the gas velocity. 2. The film production, consisted of the processes such as self-nucleation, growth of particle and collection of particles on the base, was analyzed taking into account the interaction between the temperature and mass fields. By comparison with the experimental results, the film production and the transport process of particles were clarified analytically. The production velocity and diameter of particle were also deduced in relation to the operating parameters. 3. On the basis of the above findings, the fundamental knowledge of film manufacturing process by PPCVD were obtained. |
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内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 研究課題/領域番号:03650177, 研究期間(年度):1991-1992 | |||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 出典:「化学気相成長法による薄膜製造の高効率化」研究成果報告書 課題番号03650177 (KAKEN:科学研究費助成事業データベース(国立情報学研究所)) 本文データは著者版報告書より作成 |
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著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://kaken.nii.ac.jp/search/?qm=20019780 | |||||
関連名称 | https://kaken.nii.ac.jp/search/?qm=20019780 | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-03650177/ | |||||
関連名称 | https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-03650177/ | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://kaken.nii.ac.jp/report/KAKENHI-PROJECT-03650177/036501771992kenkyu_seika_hokoku_gaiyo/ | |||||
関連名称 | https://kaken.nii.ac.jp/report/KAKENHI-PROJECT-03650177/036501771992kenkyu_seika_hokoku_gaiyo/ |