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Controlling the Pore Structure of Polyimide Films Prepared by Exposure to High-Pressure CO2 and UV Light
https://doi.org/10.24517/00051413
https://doi.org/10.24517/00051413af5fe91a-f170-4dfd-a794-50e35dfc68ae
名前 / ファイル | ライセンス | アクション |
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TE-PR-TAKI-K-619.pdf (4.7 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2018-07-02 | |||||
タイトル | ||||||
タイトル | Controlling the Pore Structure of Polyimide Films Prepared by Exposure to High-Pressure CO2 and UV Light | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
ID登録 | ||||||
ID登録 | 10.24517/00051413 | |||||
ID登録タイプ | JaLC | |||||
著者 |
Taki, Kentaro
× Taki, Kentaro× Isawa, Tatsuki× Mizoguchi, Akira |
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著者別表示 |
瀧, 健太郎
× 瀧, 健太郎 |
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提供者所属 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 金沢大学理工研究域機械工学系 | |||||
書誌情報 |
Journal of Photopolymer Science and Technology en : フォトポリマー懇話会誌 巻 30, 号 6, p. 619-625, 発行日 2017 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0914-9244 | |||||
NCID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11576862 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.30.619 | |||||
出版者 | ||||||
出版者 | Technical Association of Photopolymers = フォトポリマー懇話会 | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Porous polyimide is a promising low-permittivity material for reducing the attenuation of high-frequency signals. Previously, the suitability of porous polyimide films for flexible printed circuits was tested by subjecting them to cover-layering and copper plating. These treatments resulted in pore collapse and infiltration, respectively, indicating the necessity of using closed-pore films. Herein, closed-pore porous polyimide films were prepared at various CO2 gas pressures, tertiary amine methacrylate monomer concentrations, and pre-baking times, revealing the key role of pre-baking time in maximizing porosity while preserving closed pores. In contrast to our previous study, the formation of closed pores was explained by a novel mechanism featuring CO2 bubble nucleation as a key step. | |||||
権利 | ||||||
権利情報 | Copyright © Technical Association of Photopolymers フォトポリマー懇話会 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://www.jstage.jst.go.jp/browse/photopolymer/-char/en | |||||
関連名称 | https://www.jstage.jst.go.jp/browse/photopolymer/-char/en | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | http://www.tapj.jp/ | |||||
関連名称 | http://www.tapj.jp/ |