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Propagation loss of amorphous silicon optical waveguides at the 0.8 µm-wavelength range
https://doi.org/10.24517/00008160
https://doi.org/10.24517/000081605493664a-887e-4627-8bb7-b9e85109ffdc
名前 / ファイル | ライセンス | アクション |
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TE-PR-MARUYAMA-T-269.pdf (452.0 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2017-10-03 | |||||
タイトル | ||||||
タイトル | Propagation loss of amorphous silicon optical waveguides at the 0.8 µm-wavelength range | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
ID登録 | ||||||
ID登録 | 10.24517/00008160 | |||||
ID登録タイプ | JaLC | |||||
著者 |
Asukai, Takahiro
× Asukai, Takahiro× Inamoto, Makoto× Maruyama, Takeo× Iiyama, Koichi× Ohdaira, Keisuke× Matsumura, Hideki |
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著者別表示 |
丸山, 武男
× 丸山, 武男× 飯山, 宏一 |
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提供者所属 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 金沢大学理工研究域電子情報学系 | |||||
書誌情報 |
IEEE International Conference on Group IV Photonics GFP 号 5643356, p. 269-271, 発行日 2010-01-01 |
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DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1109/GROUP4.2010.5643356 | |||||
出版者 | ||||||
出版者 | IEEE = Institute of Electrical and Electronics Engineers | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | We fabricated optical waveguides using amorphous silicon deposited by catalytic chemical vapor deposition method. The waveguides were fabricated by photolithography and wet chemical etching. The propagation loss of 15 dB/cm at 830 nm was measured. ©2010 IEEE. | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=5643356 |