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電気泳動現象利用による表面研磨 (FFF) (第2報): 加工圧力付与による窒化けい素の研磨
http://hdl.handle.net/2297/42764
http://hdl.handle.net/2297/42764beac7285-f596-4980-8ccc-509a3246db61
名前 / ファイル | ライセンス | アクション |
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TE-PR-KUROBE-T-1685.pdf (3.0 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2017-10-03 | |||||
タイトル | ||||||
タイトル | 電気泳動現象利用による表面研磨 (FFF) (第2報): 加工圧力付与による窒化けい素の研磨 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Electric Field-assisted Polishing Using Electrophoresis Phenomenon (2nd Report): Polishing of Silicon Nitride under Applied Load | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
黒部, 利次
× 黒部, 利次× 高山, 昌也× 中田, 邦夫× 上田, 修治 |
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書誌情報 |
精密工学会誌 = Journal of the Japan Society for Precision Engineering 巻 54, 号 9, p. 1685-1690, 発行日 1988-01-01 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0912-0289 | |||||
NCID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AN1003250X | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2493/jjspe.54.1685 | |||||
出版者 | ||||||
出版者 | 精密工学会 = The Japan Society for Precision Engineering | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Polishing of silicon nitride has been conducted by using a newly-developed finishing setup which is able to give the polishing pressure to the workpiece. The polishing is made by using an electrophoresis phenomenon of fine grain in liquid. When the electric power of DC voltage is supplied to the electrode set into the polishing compound, the grain moves and causes the polishing action to the workpiece surface. The polishing pad is put onto the stainless disc electrode. It is found from the experiments that unwoven polishing pad and reddish ferrite grain are suitable for the finishing of silicon nitride. Experimental results show that the stock removal rate increases with both the applied potential and load. The characteristics of surface polished are examined by X-ray photo spectroscopy. Photo electron spectra observed suggest that the mechanochemical actions arise on the surface of silicon nitride during the polishing process. | |||||
権利 | ||||||
権利情報 | Copyright © The Japan Society for Precision Engineering 精密工学会 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://www.jstage.jst.go.jp/browse/jjspe/-char/ja/ | |||||
関連URI | ||||||
識別子タイプ | URI | |||||
関連識別子 | http://www.jspe.or.jp/ |