2026-03-08T21:35:16Z https://kanazawa-u.repo.nii.ac.jp/oai

oai:kanazawa-u.repo.nii.ac.jp:00008233 2024-06-20T06:14:46Z 934:935:936

Thermally and chemically non-equilibrium modelling of Ar-N2-H2 inductively coupled plasmas at reduced pressure Tanaka, Yasunori 67 90303263 90303263 90303263 A two-dimensional thermally and chemically non-equilibrium model was developed for Ar-N2-H2 inductively coupled plasmas (ICP) at reduced pressure. The Ar-N2-H2 or Ar-NH3 plasmas at reduced pressure has been widely used for nitriding processing of materials. Totally 164 reactions including 82 forward reactions and their backward reactions were taken into account. Spatial particle composition distribution in the plasma torch as well as in the reaction chamber was derived by solving simultaneously the mass conservation equation of each particle, considering diffusion, convection and production terms. © 2009 Elsevier B.V. All rights reserved. 金沢大学理工研究域電子情報学系 journal article Elsevier BV 2009-12-30 AM application/pdf Thin Solid Films 3 518 936 942 AA00863068 0040-6090 https://kanazawa-u.repo.nii.ac.jp/record/8233/files/TE-PR-TANAKA-Y-936.pdf http://hdl.handle.net/2297/23881 https://kanazawa-u.repo.nii.ac.jp/records/8233 eng 10.1016/j.tsf.2009.07.173 http://www.elsevier.com/locate/issn/00406090