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oai:kanazawa-u.repo.nii.ac.jp:00009688 2024-06-20T06:18:35Z 934:935:936

熱CVD法によるジルコニア膜合成時の堆積速度の推定 Numerical Analysis of Deposition Rates of Zirconium Thin Films by Thermal Chemical Vapor Deposition 中村, 静夫 14080 林, 良茂 14081 川西, 琢也 59 80234087 80234087 80234087 小松, 利照 14082 竹内, 昌史 14083 Zirconia films were prepared by the CVD method using thermal decomposition of zirconium-tetra-i-propoxide with He gas under 20 kPa. The films on the substrate consisted of fine particles less than 1μm and were metastable tetragonal-zirconia. The maximum deposition rate was 6 nm/s at 673 K and a reactant gas concentration of 0.05 mol%. The profile of deposition rate was calculated using a simplified reaction and coagulation model. The calculated results showed a good agreement with the experimental data under the operating conditions of 673 K and 0.07 mol%. Deposition rates for the system used are estimated with this model. 金沢大学理工研究域自然システム学系 journal article The Ceramic Society of Japan = 日本セラミックス協会 1992-03-01 VoR application/pdf Journal of the Ceramic Society of Japan = 日本セラミックス協会学術論文誌 1159 100 266 271 AA12312210 0914-5400 https://kanazawa-u.repo.nii.ac.jp/record/9688/files/TE-PR-KAWANISHI-T-266.pdf http://hdl.handle.net/2297/23861 https://kanazawa-u.repo.nii.ac.jp/records/9688 jpn http://www.ceramic.or.jp/ http://ci.nii.ac.jp/naid/110002290170/en/ 本文データは日本セラミックス協会の許諾に基づきCiNiiから複製したものである