@misc{oai:kanazawa-u.repo.nii.ac.jp:00037102,
 author = {Atif, Mossad Ali},
 month = {Sep},
 note = {000003542076, 取得学位：博士(学術)，学位授与番号：博甲第436号，学位授与年月日：平成13年9月28日,学位授与年：2001},
 title = {Formation of crystalline silicon films having nanometer-size grains using a plasma-enhanced chemical vapor deposition technique},
 year = {2002}
}