{"created":"2023-07-27T06:51:35.570146+00:00","id":45074,"links":{},"metadata":{"_buckets":{"deposit":"f7d9ba95-768f-4191-a1f2-a9c893481263"},"_deposit":{"created_by":18,"id":"45074","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"45074"},"status":"published"},"_oai":{"id":"oai:kanazawa-u.repo.nii.ac.jp:00045074","sets":["934:935:936"]},"author_link":["78425","78429","78430","78425"],"control_number":"45074","item_4_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2017","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageEnd":"625","bibliographicPageStart":"619","bibliographicVolumeNumber":"30","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"},{"bibliographic_title":"フォトポリマー懇話会誌","bibliographic_titleLang":"en"}]}]},"item_4_creator_33":{"attribute_name":"著者別表示","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"瀧, 健太郎"}],"nameIdentifiers":[{"nameIdentifier":"78425","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70402964","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=70402964"}]}]},"item_4_description_21":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Porous polyimide is a promising low-permittivity material for reducing the attenuation of high-frequency signals. Previously, the suitability of porous polyimide films for flexible printed circuits was tested by subjecting them to cover-layering and copper plating. These treatments resulted in pore collapse and infiltration, respectively, indicating the necessity of using closed-pore films. Herein, closed-pore porous polyimide films were prepared at various CO2 gas pressures, tertiary amine methacrylate monomer concentrations, and pre-baking times, revealing the key role of pre-baking time in maximizing porosity while preserving closed pores. In contrast to our previous study, the formation of closed pores was explained by a novel mechanism featuring CO2 bubble nucleation as a key step.","subitem_description_type":"Abstract"}]},"item_4_description_5":{"attribute_name":"提供者所属","attribute_value_mlt":[{"subitem_description":"金沢大学理工研究域機械工学系","subitem_description_type":"Other"}]},"item_4_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24517/00051413","subitem_identifier_reg_type":"JaLC"}]},"item_4_publisher_17":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Technical Association of Photopolymers = フォトポリマー懇話会"}]},"item_4_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.30.619","subitem_relation_type_select":"DOI"}}]},"item_4_relation_28":{"attribute_name":"関連URI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"https://www.jstage.jst.go.jp/browse/photopolymer/-char/en"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://www.jstage.jst.go.jp/browse/photopolymer/-char/en","subitem_relation_type_select":"URI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://www.tapj.jp/"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://www.tapj.jp/","subitem_relation_type_select":"URI"}}]},"item_4_rights_23":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright © Technical Association of Photopolymers フォトポリマー懇話会"}]},"item_4_source_id_11":{"attribute_name":"NCID","attribute_value_mlt":[{"subitem_source_identifier":"AA11576862","subitem_source_identifier_type":"NCID"}]},"item_4_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-9244","subitem_source_identifier_type":"ISSN"}]},"item_4_version_type_25":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Taki, Kentaro"}],"nameIdentifiers":[{"nameIdentifier":"78425","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70402964","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=70402964"}]},{"creatorNames":[{"creatorName":"Isawa, Tatsuki"}],"nameIdentifiers":[{"nameIdentifier":"78429","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Mizoguchi, Akira"}],"nameIdentifiers":[{"nameIdentifier":"78430","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-07-02"}],"displaytype":"detail","filename":"TE-PR-TAKI-K-619.pdf","filesize":[{"value":"4.7 MB"}],"format":"application/pdf","licensetype":"license_11","mimetype":"application/pdf","url":{"label":"TE-PR-TAKI-K-619.pdf","url":"https://kanazawa-u.repo.nii.ac.jp/record/45074/files/TE-PR-TAKI-K-619.pdf"},"version_id":"40aed9f4-fe76-4924-b731-a6785429d164"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Controlling the Pore Structure of Polyimide Films Prepared by Exposure to High-Pressure CO2 and UV Light","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Controlling the Pore Structure of Polyimide Films Prepared by Exposure to High-Pressure CO2 and UV Light","subitem_title_language":"en"}]},"item_type_id":"4","owner":"18","path":["936"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2018-07-02"},"publish_date":"2018-07-02","publish_status":"0","recid":"45074","relation_version_is_last":true,"title":["Controlling the Pore Structure of Polyimide Films Prepared by Exposure to High-Pressure CO2 and UV Light"],"weko_creator_id":"18","weko_shared_id":-1},"updated":"2024-06-20T06:48:29.323483+00:00"}