{"created":"2023-07-27T06:55:32.949937+00:00","id":51580,"links":{},"metadata":{"_buckets":{"deposit":"751be55d-ccc6-4a23-a2b5-78f74ddf6f80"},"_deposit":{"created_by":18,"id":"51580","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"51580"},"status":"published"},"_oai":{"id":"oai:kanazawa-u.repo.nii.ac.jp:00051580","sets":["2812:2813:3929"]},"author_link":["79881","79880"],"item_9_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2020-05-27","bibliographicIssueDateType":"Issued"},"bibliographicPageStart":"12p.","bibliographicVolumeNumber":"2017-04-01 - 2020-03-31","bibliographic_titles":[{"bibliographic_title":"令和1(2019)年度 科学研究費補助金 基盤研究(B) 研究成果報告書"},{"bibliographic_title":"2019 Fiscal Year Final Research Report","bibliographic_titleLang":"en"}]}]},"item_9_creator_33":{"attribute_name":"著者別表示","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Uchida, Hirohisa"}],"nameIdentifiers":[{"nameIdentifier":"79881","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70313294","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=70313294"}]}]},"item_9_description_21":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"本研究では，我々が考案した「超臨界二酸化炭素を用いた噴霧晶析法による有機製膜技術」による高性能有機半導体デバイスを実現可能な有機薄膜創製を目標として，本技術による有機製膜機構の解明とその成果に基づいた有機薄膜の自由設計（薄膜設計）技術の開発を行った。具体的には，有機薄膜特性に及ぼす種々の操作因子の影響を系統的に調査し，有機製膜機構の解明に繋がる基礎的知見の蓄積を行い，薄膜設計指針を明らかにした。さらに，製膜機構の解明や薄膜設計技術立案への基礎的知見として必要不可欠な超臨界二酸化炭素に対する有機半導体材料の溶解度の測定と推算モデル開発を実施した。","subitem_description_type":"Abstract"},{"subitem_description":"In this work, we elucidated the deposition mechanism of organic films produced by atomizing crystallization using supercritical carbon dioxide and developed the thin film design technique of organic thin films by the present technique based on the experimental results in order to propose organic thin films deposition technique that enables to realize high-performance organic semiconductor devices by the present technique. Specifically, we systematically investigated the effects of various operating factors on the characteristics of organic thin films, accumulated basic knowledge that led to the elucidation of organic film deposition mechanisms, and clarified the thin film design guidelines. Furthermore, we measured the solubility of organic semiconductor materials in supercritical carbon dioxide, which is indispensable as a basic knowledge for elucidating the thin film deposition mechanism and proposing thin film design technique, and developed solubility estimation models.","subitem_description_type":"Abstract"}]},"item_9_description_22":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"研究課題/領域番号:17H03440, 研究期間(年度):2017-04-01 - 2020-03-31","subitem_description_type":"Other"},{"subitem_description":"出典：「超臨界二酸化炭素を用いた噴霧晶析法による高性能有機薄膜創製と薄膜自由設計への展開」研究成果報告書　課題番号17H03440\n（KAKEN：科学研究費助成事業データベース（国立情報学研究所））\n（https://kaken.nii.ac.jp/report/KAKENHI-PROJECT-17H03440/17H03440seika/)を加工して作成","subitem_description_type":"Other"}]},"item_9_description_5":{"attribute_name":"提供者所属","attribute_value_mlt":[{"subitem_description":"金沢大学理工研究域フロンティア工学系","subitem_description_type":"Other"}]},"item_9_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24517/00057883","subitem_identifier_reg_type":"JaLC"}]},"item_9_relation_28":{"attribute_name":"関連URI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"https://kaken.nii.ac.jp/search/?qm=70313294"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://kaken.nii.ac.jp/search/?qm=70313294","subitem_relation_type_select":"URI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-17H03440/"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-17H03440/","subitem_relation_type_select":"URI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"https://kaken.nii.ac.jp/report/KAKENHI-PROJECT-17H03440/17H03440seika/"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://kaken.nii.ac.jp/report/KAKENHI-PROJECT-17H03440/17H03440seika/","subitem_relation_type_select":"URI"}}]},"item_9_version_type_25":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"内田, 博久"}],"nameIdentifiers":[{"nameIdentifier":"79880","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"70313294","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=70313294"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2021-04-22"}],"displaytype":"detail","filename":"TE-PR-UCHIDA-H-kaken 2020-12p.pdf","filesize":[{"value":"871.8 kB"}],"format":"application/pdf","licensetype":"license_11","mimetype":"application/pdf","url":{"label":"TE-PR-UCHIDA-H-kaken 2020-12p.pdf","url":"https://kanazawa-u.repo.nii.ac.jp/record/51580/files/TE-PR-UCHIDA-H-kaken 2020-12p.pdf"},"version_id":"70f9a6f4-a625-469b-bc64-225d6f99e884"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"research report","resourceuri":"http://purl.org/coar/resource_type/c_18ws"}]},"item_title":"超臨界二酸化炭素を用いた噴霧晶析法による高性能有機薄膜創製と薄膜自由設計への展開","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"超臨界二酸化炭素を用いた噴霧晶析法による高性能有機薄膜創製と薄膜自由設計への展開"},{"subitem_title":"Deposition of High Performance Organic Thin Films by Atomizing Crystallization Using Supercritical Carbon Dioxide and the Development to Thin Films Design","subitem_title_language":"en"}]},"item_type_id":"9","owner":"18","path":["3929"],"pubdate":{"attribute_name":"公開日","attribute_value":"2021-04-22"},"publish_date":"2021-04-22","publish_status":"0","recid":"51580","relation_version_is_last":true,"title":["超臨界二酸化炭素を用いた噴霧晶析法による高性能有機薄膜創製と薄膜自由設計への展開"],"weko_creator_id":"18","weko_shared_id":-1},"updated":"2024-07-01T05:24:07.415324+00:00"}