{"created":"2023-07-27T06:24:32.817821+00:00","id":7495,"links":{},"metadata":{"_buckets":{"deposit":"bb04ae7e-74c6-4b8c-a898-917a28c9e94f"},"_deposit":{"created_by":3,"id":"7495","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"7495"},"status":"published"},"_oai":{"id":"oai:kanazawa-u.repo.nii.ac.jp:00007495","sets":["934:935:936"]},"author_link":["9954","9953","9952","367"],"item_4_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2005-01-01","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"606","bibliographicPageStart":"601","bibliographicVolumeNumber":"490-491","bibliographic_titles":[{"bibliographic_title":"Materials Science Forum"}]}]},"item_4_description_21":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In depositing the TiN thin films to the substrate by Physical Vapor Deposition (PVD), it influences the substrate interface. Change of the residual stress and the full-width at half maximum (FWHM) in each process of the TiN deposition of thin film was measured by the X-ray stress measurement. As a result of the X-ray stress measurement, there are no changes in the residual stress and the FWHM. It is thought that there is a difference in the penetration depth to the substrate of X-rays and Ti ion.","subitem_description_type":"Abstract"}]},"item_4_description_5":{"attribute_name":"提供者所属","attribute_value_mlt":[{"subitem_description":"金沢大学大学院自然科学研究科システム創成科学専攻","subitem_description_type":"Other"}]},"item_4_publisher_17":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Trans Tech Publications"}]},"item_4_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.4028/www.scientific.net/MSF.490-491.601","subitem_relation_type_select":"DOI"}}]},"item_4_source_id_11":{"attribute_name":"NCID","attribute_value_mlt":[{"subitem_source_identifier":"AA10695957","subitem_source_identifier_type":"NCID"}]},"item_4_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0255-5476","subitem_source_identifier_type":"ISSN"}]},"item_4_version_type_25":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Hirose, Hajime"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Suzuki, Shinya"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Goto, Masahide"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Sasaki, Toshihiko"}],"nameIdentifiers":[{},{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-10-03"}],"displaytype":"detail","filename":"TE-PR-GOTOH-M-601.pdf","filesize":[{"value":"275.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"TE-PR-GOTOH-M-601.pdf","url":"https://kanazawa-u.repo.nii.ac.jp/record/7495/files/TE-PR-GOTOH-M-601.pdf"},"version_id":"036c6d00-7572-4622-b213-cbf4d3427530"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Influence of interfacial neighborhood on residual stress due to deposition of TiN thin films made by PVD","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Influence of interfacial neighborhood on residual stress due to deposition of TiN thin films made by PVD"}]},"item_type_id":"4","owner":"3","path":["936"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-10-03"},"publish_date":"2017-10-03","publish_status":"0","recid":"7495","relation_version_is_last":true,"title":["Influence of interfacial neighborhood on residual stress due to deposition of TiN thin films made by PVD"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-07-27T12:21:14.967126+00:00"}