@article{oai:kanazawa-u.repo.nii.ac.jp:00008173,
 author = {丸山, 武男 and 飯山, 宏一 and Asukai, Takahiro and Inamoto, Makoto and Maruyama, Takeo and Iiyama, Koichi and Ohdaira, Keisuke and Matsumura, Hideki},
 issue = {5643356},
 journal = {IEEE International Conference on Group IV Photonics GFP},
 month = {Jan},
 note = {We fabricated optical waveguides using amorphous silicon deposited by catalytic chemical vapor deposition method. The waveguides were fabricated by photolithography and wet chemical etching. The propagation loss of 15 dB/cm at 830 nm was measured. ©2010 IEEE., 金沢大学理工研究域電子情報学系},
 pages = {269--271},
 title = {Propagation loss of amorphous silicon optical waveguides at the 0.8 µm-wavelength range},
 year = {2010}
}