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Thermally and chemically non-equilibrium modelling of Ar-N2-H2 inductively coupled plasmas at reduced pressure
http://hdl.handle.net/2297/23881
http://hdl.handle.net/2297/238816aa8cb75-3f19-490b-acb7-abacdf5cd683
| 名前 / ファイル | ライセンス | アクション |
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
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| 公開日 | 2017-10-03 | |||||
| タイトル | ||||||
| タイトル | Thermally and chemically non-equilibrium modelling of Ar-N2-H2 inductively coupled plasmas at reduced pressure | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| 著者 |
Tanaka, Yasunori
× Tanaka, Yasunori |
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| 提供者所属 | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | 金沢大学理工研究域電子情報学系 | |||||
| 書誌情報 |
Thin Solid Films 巻 518, 号 3, p. 936-942, 発行日 2009-12-30 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0040-6090 | |||||
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| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00863068 | |||||
| DOI | ||||||
| 関連タイプ | isVersionOf | |||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1016/j.tsf.2009.07.173 | |||||
| 出版者 | ||||||
| 出版者 | Elsevier BV | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | A two-dimensional thermally and chemically non-equilibrium model was developed for Ar-N2-H2 inductively coupled plasmas (ICP) at reduced pressure. The Ar-N2-H2 or Ar-NH3 plasmas at reduced pressure has been widely used for nitriding processing of materials. Totally 164 reactions including 82 forward reactions and their backward reactions were taken into account. Spatial particle composition distribution in the plasma torch as well as in the reaction chamber was derived by solving simultaneously the mass conservation equation of each particle, considering diffusion, convection and production terms. © 2009 Elsevier B.V. All rights reserved. | |||||
| 著者版フラグ | ||||||
| 出版タイプ | AM | |||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
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| 識別子タイプ | URI | |||||
| 関連識別子 | http://www.elsevier.com/locate/issn/00406090 | |||||