@article{oai:kanazawa-u.repo.nii.ac.jp:00009185,
 author = {安達, 正明 and 上田, 覚児 and 榎本, 文彦},
 issue = {11},
 journal = {精密工学会誌論文集 = Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers},
 month = {Jan},
 note = {広帯域スペクトル光での干渉を用いて, 段差を持つ超精密部品等の形状を高速に測定する方法を述べている. 高速化を図るため, 2色のLED光を用い位相シフト量をそれぞれ6π±π/2とし, 110 Hzで交互に色別の干渉像を取り込んで波長別の位相を計算する方法で, 3次元形状をnmの計測精度でありながら垂直走査速度45 μm/sで計測可能なことを示している. We propose a high-speed vertical scanning profilometry which has nanometric height precision. The proposed profilometry is equipped with two short-coherent-light sources, which are made of extremely-high-power light emitting diodes (LED). In 3-D profile measurements, the profilometry acquires many interferograms while vertically scanning a Mirau-type objective with 0.407-μm movement/interferogram and alternately-flashing LED. Odd-numbered interferograms are acquired with 503-nm LED and even-numbered interferograms are with 591-nm LED. Regarding the acquired interferograms, a computer calculates phase and modulation contrast using a phase-shifting technique. As two movements are repeated between acquirements of the same-color interferograms, phase step corresponds to approximately 6π + π/2 with 503 nm and approximately 6π - π/2 with 591 nm, respectively. After searching the interferogram having a contrast peak, the computer extracts optical path difference of the searched interferogram with nanometric resolution from the phase information. From the vertical movement length of 0.407 μm and a frame rate of 111 Hz, a vertical scanning speed is given as 45.2 μm/s. Nanometric height precision of the profilometry is checked using the measured data of a step height standard.},
 pages = {1404--1409},
 title = {2個の高輝度LEDと垂直走査型干渉計を用いる高速nm精度形状計測},
 volume = {71},
 year = {2005}
}