{"created":"2023-07-27T06:26:06.498961+00:00","id":9688,"links":{},"metadata":{"_buckets":{"deposit":"d9835f5f-a8a8-4235-acbc-f3719437f12a"},"_deposit":{"created_by":3,"id":"9688","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"9688"},"status":"published"},"_oai":{"id":"oai:kanazawa-u.repo.nii.ac.jp:00009688","sets":["934:935:936"]},"author_link":["14081","14080","59","14082","14083"],"item_4_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1992-03-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1159","bibliographicPageEnd":"271","bibliographicPageStart":"266","bibliographicVolumeNumber":"100","bibliographic_titles":[{"bibliographic_title":"Journal of the Ceramic Society of Japan = 日本セラミックス協会学術論文誌"}]}]},"item_4_description_21":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Zirconia films were prepared by the CVD method using thermal decomposition of zirconium-tetra-i-propoxide with He gas under 20 kPa. The films on the substrate consisted of fine particles less than 1μm and were metastable tetragonal-zirconia. The maximum deposition rate was 6 nm/s at 673 K and a reactant gas concentration of 0.05 mol%. The profile of deposition rate was calculated using a simplified reaction and coagulation model. The calculated results showed a good agreement with the experimental data under the operating conditions of 673 K and 0.07 mol%. Deposition rates for the system used are estimated with this model.","subitem_description_type":"Abstract"}]},"item_4_description_5":{"attribute_name":"提供者所属","attribute_value_mlt":[{"subitem_description":"金沢大学理工研究域自然システム学系","subitem_description_type":"Other"}]},"item_4_publisher_17":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Ceramic Society of Japan = 日本セラミックス協会"}]},"item_4_relation_28":{"attribute_name":"関連URI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://www.ceramic.or.jp/","subitem_relation_type_select":"URI"}},{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://ci.nii.ac.jp/naid/110002290170/en/","subitem_relation_type_select":"URI"}}]},"item_4_rights_23":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"本文データは日本セラミックス協会の許諾に基づきCiNiiから複製したものである"}]},"item_4_source_id_11":{"attribute_name":"NCID","attribute_value_mlt":[{"subitem_source_identifier":"AA12312210","subitem_source_identifier_type":"NCID"}]},"item_4_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-5400","subitem_source_identifier_type":"ISSN"}]},"item_4_version_type_25":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"中村, 静夫　　"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"林, 良茂　"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"川西, 琢也　"}],"nameIdentifiers":[{},{},{},{}]},{"creatorNames":[{"creatorName":"小松, 利照　　"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"竹内, 昌史"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-10-03"}],"displaytype":"detail","filename":"TE-PR-KAWANISHI-T-266.pdf","filesize":[{"value":"867.9 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"TE-PR-KAWANISHI-T-266.pdf","url":"https://kanazawa-u.repo.nii.ac.jp/record/9688/files/TE-PR-KAWANISHI-T-266.pdf"},"version_id":"98636798-e34a-4e82-890f-7328ec42f9cb"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"熱CVD法によるジルコニア膜合成時の堆積速度の推定","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"熱CVD法によるジルコニア膜合成時の堆積速度の推定"},{"subitem_title":"Numerical Analysis of Deposition Rates of Zirconium Thin Films by Thermal Chemical Vapor Deposition","subitem_title_language":"en"}]},"item_type_id":"4","owner":"3","path":["936"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-10-03"},"publish_date":"2017-10-03","publish_status":"0","recid":"9688","relation_version_is_last":true,"title":["熱CVD法によるジルコニア膜合成時の堆積速度の推定"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-07-28T01:51:05.367496+00:00"}