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Responses of a long-coil pulse-modulated induction plasma
http://hdl.handle.net/2297/1803
http://hdl.handle.net/2297/18037ed03bdf-ac81-482c-90ac-fad951c85c10
名前 / ファイル | ライセンス | アクション |
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00922742.pdf (240.8 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2017-10-03 | |||||
タイトル | ||||||
タイトル | Responses of a long-coil pulse-modulated induction plasma | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Paul, K.C.
× Paul, K.C.× Hossain, M.M.× Hashimoto, Y.× Tanaka, Yasunori× Sakuta, Tadahiro |
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書誌情報 |
IEEE Transaction on Plasma Science 巻 29, 号 2, p. 326-334, 発行日 2001-04-01 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00933813 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1109/27.922742 | |||||
その他の識別子 | ||||||
内容記述タイプ | Other | |||||
内容記述 | AA0066803X | |||||
出版者 | ||||||
出版者 | IEEE | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Radio-frequency inductively coupled plasma in a pulse modulated approach was generated by a MOSFET inverter supply of high electric efficiency. The plasma torch has an extremely long coil region of 153 mm, which is an attractive feature for advanced materials processing, especially for better and more efficient vaporizing of solids. The operating conditions were: argon flow of 80 or 90 L/m at atmospheric pressure; supply power of 30 kW; and pulse on-time of 10 ms at 67% duty factor. Spectroscopic measurements were carried out to determine the temporal plasma properties, including the effects of shimmer current level (SCL) upon the spectral intensities. Additionally a time-dependent two-dimensional numerical model was solved for the same operating conditions employed in the experiment to predict and compare the plasma properties. Pulsed plasma dissipation sustained for a minimum SCL of 43% for 80 L/m gas flow-rate, and at any level below 43%, the plasma disappeared. Temporal variation of argon line intensities at 751 and 763.5 nm is similar, though the upper level intensity of the former one was significantly stronger than the latter. Intensified change of intensity is found at lower SCL because of higher change in the coil current and, in turn, in the plasma power. The predicted intensity of the 751-nm argon line showed similar behavior to the experimental intensity though the response around the instant of on-pulsation is somewhat slower | |||||
権利 | ||||||
権利情報 | Copyright (C) 2001 IEEE.. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE..IEEE Transaction on Plasma Science 29(2),pp.326-334 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 |